Graphene Circuit Etching by Graphene Oxide Reduction with UV Laser
Δημοσιεύτηκε στις 10 Δεκ 2015
Using
Nanoparticulate Graphene Oxide (GO) sonicated for about 30 mins in pure
deionised water, we can make flexible interdigitated graphene circuits
on a polyethylene substrate, etched using a robotic UV laser.
The
405nm Laser light then chemically reduces Graphene Oxide to Graphene in
the interdigitated circuit pattern. Such devices could then be
incorporated with a layer of polymer electrolyte to produce a flexible
and lightweight supercapacitor cell.
It is hoped that in the next
few years, developments in graphene circuit manufacture will allow for,
at the very least, new forms of lightweight, cheap to manufacture and
environmentally friendly power storage technologies.
Nanoparticulate Graphene Oxide (GO) sonicated for about 30 mins in pure
deionised water, we can make flexible interdigitated graphene circuits
on a polyethylene substrate, etched using a robotic UV laser.
The
405nm Laser light then chemically reduces Graphene Oxide to Graphene in
the interdigitated circuit pattern. Such devices could then be
incorporated with a layer of polymer electrolyte to produce a flexible
and lightweight supercapacitor cell.
It is hoped that in the next
few years, developments in graphene circuit manufacture will allow for,
at the very least, new forms of lightweight, cheap to manufacture and
environmentally friendly power storage technologies.
Κατηγορία
Άδεια
- Τυπική άδεια YouTube
Δεν υπάρχουν σχόλια:
Δημοσίευση σχολίου